Abstract
In this work, we present a methodology for real-time carbon content feedback control of a plasma-enhanced metal organic chemical vapor deposition process using optical emission spectroscopy. Initially, an estimation model of carbon content of ZrO2 thin films based on real-time optical emission spectroscopy data is presented. Then, a feedback control scheme, which employs the proposed estimation model and a proportional-integral controller, is developed to achieve carbon content control. Using this approach, a real-time control system is developed and implemented on an experimental electron cyclotron resonance high density plasma-enhanced chemical vapor deposition system at UCLA to demonstrate the effectiveness of real-time feedback control of carbon content. Experimental results of the deposition process under both open-loop and closed-loop operations are shown and compared. The advantages of operating the process under real-time feedback control in terms of higher productivity, reduced process variation and lower carbon content are demonstrated
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
