Abstract
Magnetite thin films (10–300 nm) are deposited on different substrates including single crystals ((0001)-Al2O3, (001)-Si, (110)-SiO2), textured polycrystalline oxide underlayers (ZnO), amorphous glass, at temperature from room temperature to 550 °C by the pulsed laser deposition technique. Strong (111)-texture can be obtained on single crystal Si, SiO2, amorphous glass, and (0001)-textured ZnO layer, no matter whether they have either a huge lattice mismatch or no matching at all with Fe3O4. The film on single crystal Al2O3 (sapphire) shows a (111)-epitaxial structure with a strong in plane compressive strain. The saturated magnetization for magnetite thin films grown on SiO2 and Si substrates can reach 440 emu/cc while the epitaxial films grown on Al2O3 have a magnetization around 310 emu/cc when the film thickness is 40 nm. The substrate-induced strain in the films grown on Al2O3 substrates significantly affects the magnetic anisotropy and the magnetic coupling at the anti-phase boundaries in the films.
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