Abstract
Coherent and incoherent light sources using rare gas excimers are reviewed from a point of view of post ArF lithography. Present status of electron beam pumped rare gas excimer lasers are reported. Potentialities of rare gas excimer lasers by discharge pumping are discussed. We have obtained laser gain of 2.2x10-3cm-1 in Kr discharges which was very close to the threshold gain. It is pointed out that gas excimer lasers are suitable for light sources for next generation lithography after ArF lithography in the 21th century, when a compact excitation method is established. A jet discharge excimer lamps are also discussed from a point of view of an incoherent light source for lithography.
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