Abstract
The specular reflectivity of dc magnetron sputtered Al1%Si films has been shown to depend on the deposition environment via its influence on surface roughness, fundamental optical properties and grain size. The factors affecting the specular reflectivity depend on the wavelength of light used in its measurement. The choice of substrate used to monitor specular reflectivity and the variation of specular reflectivity with substrate position in a batch mode process are discussed. The specular reflectivity is shown to affect both the automatic alignment accuracy and critical dimension size obtained during photolithographic processing, which highlights the importance of specular reflectivity control especially for batch deposition.
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