The pressure dependence of the thermal diffusion factor of the system He-octafluorocyclobutane at 300 K

Abstract

Thermal diffusion factors, α T, are reported for the system He-octafluorocyclobutane at 300 K as functions of concentration and pressure; some data are also reported for the system He- n-C 4H 10. The experimental values are extrapolated to zero pressure and the data used to predict the pressure dependence of α T at each concentration by means of theory of Oost, Los, Cauwenbergh and van Dael.