Abstract
The formic acid adsorption on an electrochemically prepared rhodium electrode has been studied by the radiochemical method. Electrochemical properties of the rhodium electrode surface in 0.5 M H 2 SO 4 have been investigated by cyclic voltammetry. It has been shown that starting from E =0.20 V the rate of HCOOH adsorption is markedly potential dependent being practically independent of the electrode potential up to E =0.20 V. It seems that the HCOOH adsorption process may be explained on the basis of the two-sites kinetics model. The data obtained for HCOOH adsorption on a rhodium electrode have been compared with those for a platinum electrode reported previously.
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