The behaviour of formic acid on a rhodium electrode

Abstract

Formic acid adsorption and its oxidation have been studied on a rhodium electrode using radiochemical and electrochemical methods. The dual path mechanism for the HCOOH oxidation on rhodium has been verified. It is supposed that the mixed ·COOH and :CO species, coupled by hydrogen bonding, form a combined product of the HCOOH chemisorption. It has been concluded that the rate determining step in the oxidation of strongly bound species should be considered as a charge transfer process. The adsorbed OH radicals as well as the water molecules are most likely the surface oxidant involved in the oxidation of the chemisorbed species. The data obtained for the adsorption and the oxidation of HCOOH on rhodium are often compared with those found for platinum.