Abstract
Amorphous (Al 2O 3) x –(TiO 2) 1− x composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al 2O 3) x –(TiO 2) 1− x composite films are linearly dependent on the Al 2O 3 mole fraction in the Al 2O 3–TiO 2 composite film. The optical constants of these Al 2O 3–TiO 2 composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al 2O 3 mole fraction. The Al 2O 3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One π-phase-shifted Al 2O 3–TiO 2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements.
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