The nanofabrication of Pt nanowire arrays at the wafer-scale and its application in glucose detection

Abstract

In this paper we present an innovative method, deposition and etching under angles (DEA), for the fabrication of ready-for-measurement platinum (Pt) nanowires at the wafer-scale. The presented fabrication approach utilizes common techniques of conventional microfabrication technology, such as microlithography, thin-film deposition and wafer-scale ion beam etching, to realize an array of Pt nanowires on a silicon substrate with an insulation layer of silicon dioxide. Well-defined nanowire arrays with wire width down to 30 nm and wire length of up to several millimeters have been realized. Furthermore, each Pt nanowire from the array is individually electrically addressable, for multiplex detection. To prove the potential applications of the fabricated Pt nanowire chips, utilization of the fabricated Pt nanowire chip in glucose detection is presented and discussed.