Abstract
This paper examines two fabrication techniques (soft lithography and UV embossing) employed in the replication of various structures at the micron and single nanometer regimes. Stretched and assembled forms of double stranded (ds) DNA (16–3μm in length) were adsorbed on coated silicon oxide. The collective results show that the resolution of all the thermally cured polymers improves significantly when the processing time between the stamp and the template is increased with s-PDMS demonstrating a lateral resolution of <10nm.
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