Abstract
Direct current magnetron sputtering of a metallic W + Au target or high-frequency magnetron sputtering of WO3 + Au oxide targets was used to prepare thin (about 100 nm) nanocrystalline WO3 films with the addition of gold (disperse layers of catalytic gold were additionally deposited on the surface of films). The composition and micromorphology of the surface of films and the electrical and gas sensitive characteristics of nitrogen dioxide sensors were studied to determine the mechanism of the influence of gold on the properties of WO3 films. The films were shown to contain the β-WO3 orthorhombic and γ-WO2.72 monoclinic phases and gold particles. The presence of the nonstoichiometric γ-WO2.72 phase was shown to increase the concentration of oxygen vacancies in films and decrease the resistance of sensors to 1–2 MΩ. Gold nanoparticles 9–15 nm in size segregated on the surface of semiconductor crystallites and increased the response of sensors to NO2. The conclusion was drawn that deposited catalytic gold layers increased the response to traces of nitrogen dioxide.
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