Abstract
In the article the method of identification of 2D→3D structure phase transition developed for differential reflection spectroscopy is presented. This phase transition was shown to be accompanied by non-linear dependence of differential reflectance Δ R/R versus deposited film thickness h. Formulas were derived for calculation of optical function of 2D and 3D structures involved in phase transition. Use of method for Cr/Si(111) system resulted in obtaining new information about Cr film growth. [DOI: 10.1380/ejssnt.2009.186]
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