The investigation of deposited organic carbon‐silicon films using cyclonic atmospheric pressure plasma polymerization

Abstract

AbstractBackgroundThe upgrading of atmospheric‐pressure plasma polymerization process, the detailed investigation of atmospheric‐pressure plasma polymerization deposited organic carbon‐silicon film features is essential to obtain the further understandings into the optimizing coating techniques.AimThis investigation demonstrates plasma cyclone deposited film features with adjusting argon gas flow rate and HMDSN monomer flow rate.MethodThis study utilized the plasma cyclone system to polymerize a carbon‐silicon film. In this study, Optical Emission Spectroscopy (OES) was employed as a diagnostic tool to indirectly inspect the chemical composition of the atmospheric‐pressure plasma polymerization's glow discharge by detecting the photo‐emitting species. The Contact Angle Goniometer, ATR‐FTIR, AFM, and XPS were used to measure the surface properties of the films deposited by plasma cyclone.ResultsThe static contact angle results show that most of the deposited films obtain the divergent contact angle values with adjusting argon gas flow rate and HMDSN monomer flow rate. ATR‐FTIR results show that argon gas flow rate and HMDSN monomer flow rate dominate the porosity of plasma cyclone deposited film surface. XPS and AFM analyses also detect the comparable trend of physicochemical characteristics of organic carbon‐silicon film with adjusting argon gas flow rate and HMDSN monomer flow rate. In summary, the organic carbon‐silicon films can be successfully polymerized by plasma cyclone.ConclusionsThe results refer that the organic carbon‐silicon film deposition on vanadium redox flow battery separator surface improved the electrolyte uptake of the cyclonic‐plasma‐coated separators was larger than that of a commercial separator.