Abstract

A method for calculating the x-ray emission intensity from thick targets as a function of the target atomic number, accelerating voltage and angle of emission has been devised, and applied to the emission of the radiation from Ag, Cu, Cr and Al. These calculations have involved a discussion of the penetration of electrons into metals and a convenient expression for the range of low energy electrons has been obtained. The theoretical emission of Cu Kα radiation has been compared with some experimental observations on emission at small angles to the target surface, with results which are satisfactory within certain limits. The bearing of these results on the design of x-ray sources, particularly for low-angle diffraction apparatus is discussed.

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