Abstract
Mechanical polishing treatment was carried out on polycrystalline CdZnTe thick films grown by close-spaced sublimation method. The influence of Al2O3 polishing powder particle sizes (2.5 μm, 1 μm and 0.05 μm) and polishing durations (1 h, 2 h and 3 h) on the structure, surface morphology and electrical performances of the CdZnTe thick films was studied by XRD, EDS, SEM, AFM and I-V characterization systems. The results showed that the reduction of the particle size of the polishing powder and the appropriate increase of the polishing time length could improve the surface roughness, surface defects and leakage current of the CdZnTe sample.
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