Abstract

The influence of strains on the ferromagnetic resonance (FMR) spectrum of submicron yttrium iron garnet (YIG) films produced by the ion beam sputtering on gadolinium-gallium garnet (GGG) and silicon (Si) substrates is explored. It is shown that the strain influence is displayed as a frequency shift of the absorption maximum in the FMR spectrum. The results indicate that the studied YIG/GGG and YIG/Si films have an efficient magnetoelastic coupling of the spin and elastic subsystems, which suggests that ion beam sputtering of YIG films on GGG and Si substructures can be a promising technique for production of straintronic devices.

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