Abstract
Solution-processing of nickel zinc oxide (IZO) thin-film transistors (TFTs) is gaining traction as a cornerstone of future display technology, promising cost-effective production. However, achieving stability in the off-current state of IZO without using Ga, a less eco-friendly dopant, remains a challenge. This study proposes a solution-based doping method for IZO semiconductors employing a Ni carrier suppressor and examines the impact of Ni on transistor operation. By leveraging the similar size of Ni2+ to Zn2+, an optimal Ni concentration selectively substitutes Zn sites, leading to a reduction in hydroxide groups bonded to Zn and enhancing the bonding strength of Ni with O. Conversely, excessive Ni addition impedes the formation of a smooth thin film. Ni-doped IZO TFT devices with optimized Ni concentrations exhibit superior performance, characterized by significantly lower off-state currents while maintaining high on-state currents compared to conventional IZO TFTs. This approach expands the repertoire of solution-processed metal oxide semiconductors, offering a sustainable alternative for carrier suppression and facilitating the cost-effective and straightforward fabrication of TFTs.
Published Version
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