The Influence of Internal Interfaces on Charge‐Carrier Diffusion in Semiconductor Heterostructures

Abstract

The ongoing miniaturization of semiconductor devices renders charge‐carrier transport along interfaces increasingly important. The characteristic length scales in state‐of‐the‐art semiconductor technology span only a few nanometers. Consequently, charge‐carrier transport inevitably occurs directly at interfaces between adjacent layers rather than being confined to a single material. Herein, charge‐carrier diffusion is systematically studied in prototypical active layer systems, namely, in type‐I direct‐gap quantum wells and in type‐II heterostructures. The impact of internal interfaces is revealed in detail as charge‐carrier diffusion takes place much closer to or even across the internal interfaces in type‐II heterostructures. Type‐I quantum wells and type‐II heterostructures exhibit comparable diffusion rates given similar inhomogeneous exciton linewidths. Consequently, the changes in the structural quality of the interfaces are responsible for changes in diffusion and charge‐carrier transport along interfaces rather than the existence of the interfaces themselves.