Abstract
Plasma enhanced chemical vapour deposition (PECVD) can be used to fabricate surfaces with a wide range of physical and chemical properties and are used in a variety of applications. Despite this, the mechanisms by which PECVD films grow are not well understood. Moreover, the species which contribute to film growth can be considered quite differently depending on the process. Particularly for functionalized plasma polymer films, the growth mechanisms are considered with respect to the chemistry of the depositing species, ignoring the physics of plasmas. Here we analyse the role ions play in the deposition of three common classes of depositing plasmas, and how these closely related fields treat ions very differently.
Highlights
While glow discharges were observed as early as 1796 [1] the term “plasma” was first coined by Irving Langmuir in 1928 [2]
For functionalized plasma polymer films, the growth mechanisms are considered with respect to the chemistry of the depositing species, ignoring the physics of plasmas
For example silane plasmas are used in solar cells [10] and microelectronics [11], diamond-like carbon (DLC) coatings are used as hard, wear-resistant barriers for mechanical parts and biomedical implants [12], while soft functionalized plasma polymers may be used to attach biomolecules to surfaces for improved biocompatibility or drug delivery [13]
Summary
Reviewed by: Mikhail Shneider, Princeton University, USA Alan A Howling, Ecole Polytechnique Fédérale de Lausanne-CRPP, Switzerland Rony Snyders, University of Mons, Belgium Lenka Zajícková, Masaryk University, Czech Republic. Plasma enhanced chemical vapor deposition (PECVD) can be used to fabricate surfaces with a wide range of physical and chemical properties and are used in a variety of applications. The mechanisms by which PECVD films grow are not well understood. The species which contribute to film growth can be considered quite differently depending on the process. For functionalized plasma polymer films, the growth mechanisms are considered with respect to the chemistry of the depositing species, ignoring the physics of plasmas. We analyse the role ions play in the deposition of three common classes of depositing plasmas, and how these closely related fields treat ions very differently
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