Abstract
Favorite transition metal oxide of MoOx is facilely deposited by using magnetron sputtering process and cast successful application to organic light-emitting diodes (OLEDs). Magnetron sputtered MoOx is characterized in details with X-ray diffraction, scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy. Magnetron sputtered MoOx shows amorphous structure, superior film morphology, non-stoichiometry with slight oxygen deficiency and enhanced surface work function, which favorably contributes to hole injection promotion and efficiency improvement. The OLED with magnetron sputtered MoOx as hole injection layer behaves comparable performance to the counterpart with conventional vacuum thermally-evaporated MoOx. The results demonstrate that magnetron sputtering technique provides an alternative approach for fabricating MoOx interfacial layer in organic electronic devices.
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