Abstract
Free-standing microstructures such as resistors, superconductors and cantilever beams are made on Si substrates using the anisotropic etchant KOH+H2O. Resistant masks of Si3N4 or Nb are patterned by dry etching and then become partially suspended during the liquid etch process. Promising device structures include resistors suspended from each end for low mass sensors, and a long beam which is deflected electrostatically to control the size of, or to close, a gap.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
