Abstract
The development of EUV lithography (EUVL) is critically based on the availability of a suitable metrology. The industrial demand for high accuracy characterization of EUV components is met at the laboratory of the Physikalisch-Technische Bundesanstalt (PTB) operated at the electron storage ring BESSY II. Using stable and well-characterized synchrotron radiation, PTB performs – in cooperation with industry – the characterization of optical components (reflectometry), the calibration and characterization of EUV radiation detectors and sources and lifetime characterization of optics and sensors. Recent examples from either of these working areas are presented.
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