Year-end Sale % OFF 
Abstract
We have developed a technique for observing fine wiring patterns using moiré patterns generated by interference between wiring patterns and reference patterns in endpoint detection (EPD) of the CMP. With this technique, wiring pattern images of patterned wafers can be evaluated with a simple and low magnification optical system to observe large moiré patterns. In this process, the large moiré pattern is calculated from the device wiring and other reference pattern layouts. As a result, EPD signals can be detected.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
