Abstract
The effect of the electron bombardment of NaCl substrates on the epitaxial growth of gold and silver films was investigated by transmission electron microscopy and Auger electron spectroscopy. The results indicate that anion surface vacancies are created during low energy electron bombardment; these vacancies, in turn, promote nucleation and subsequent epitaxial growth of vapor-deposited films. Nucleation is interpreted in terms of the attraction of metal atoms to the surface vacancies and the subsequent formation of a rigid cluster in an epitaxial orientation. These clusters then grow by the accretion of deposited atoms to form epitaxial islands which eventually coalesce with near-perfect register to form a continuous film characterized by a high degree of epitaxy and low defect densities.
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