Abstract
A systematic analysis of the effect of some vacuum deposition conditions on the structure of (111) silver and gold epitaxial films has been carried out. For silver films deposited on mica continuity can be attained at a thickness of ∼ 1500 A, with a substratum temperature of 275 °C and a deposition rate of 40 A/s. Continuous gold films ∼ 250 A thick can be deposited on these silver films: the D.P. boundary density is minimized with a substratum temperature of ∼ 300 °C and a deposition rate lower than 1 A/s. These results show a substantial agreement with the current theories on the nucleation and growth of epitaxial films.
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