Abstract
FeAlN films were deposited on patterned lines of photoresist, hardcured before deposition, as well as on bare, flat substrates inclined at an angle to the sputter source. Both of these geometries were intended to examine the effect of oblique incidence deposition on the anisotropy of reactively sputtered FeAlN films. Films on topographic substrates showed anisotropy fields of up to 75 Oe, while films on bare tilted substrates showed anisotropy fields up to 100 Oe, presenting the possibility of low permeability in the sloping regions of thin film recording heads which utilize these materials for inductive head poles.
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