Abstract
The self-diffusion of uranium with U-233 as tracer was measured in stoichiometric UC which was doped with Fe, Ni or W impurities. The impurities were added by flash evaporation on the UC and subsequent diffusion into the UC. Uranium diffusion was increased in the doped samples as compared to undoped UC at all temperatures studied (1380 to 2200°C). The increase was most pronounced (more than a factor of 100) at low temperatures. Simultaneously, pronounced grain-boundary penetration was observed at low temperatures, possibly due to eutectic formation at the grain boundaries. The ratio of grain boundary to lattice diffusion coefficients at 1380°C was of the order of 3 × 10 4. The present data serve to explain some of the scatter of the literature data and correlate well with the known increased rate of sintering of Ni-doped UC.
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