Abstract
MoS 2 Ti composite films were deposited on silicon wafers and AISI 440C steel substrates with different target currents and working pressures by closed field unbalanced magnetron sputtering (CFUBMS). The composition of MoS 2 Ti films was determined by EDS. Crystallographic properties of MoS 2 Ti composite films produced were investigated by XRD and the friction and wear properties were determined by means of pin-on-disk tribotester. The effect of deposition parameters and Ti content on crystallographic orientation and friction coefficient and wear rate was examined.
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