Abstract
In this study, we deposited low-resistivity molybdenum (Mo) thin films on soda-lime glass substrates with good adhesion. We adjusted various deposition parameters such as the sputtering power (52–102W), working distance (5.5–9cm) and annealing temperature (26–400°C) to investigate their impact on the sheet resistance. By using a DC magnetron sputtering system, we obtained Mo thin films having the lowest sheet resistance of 0.190Ω/□ with a sputtering power of 82W, working distance of 6.5cm, and annealing temperature of 400°C; in addition, these films had good adhesivity. These Mo thin films were suitable for use as the Mo back contact in Cu(In,Ga)Se2-based solar cells.
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