Abstract
The research studies the effect of the distance between the sample and the plasma sputtering source on the properties of the junction (silicon wafer-carbon nanotubes). The silicon wafer is fixed at (near, medium and far distances from the plasma source which is in the form of high purity graphite rod heated electrically). For the three cases, thickness of the sample is constant (20 nm). The samples were studied by scanning electron (SEM) and atomic force microscopes (AFM), X-ray and Raman spectra. For optimum distances the carbon layer is in the form of multi wall carbon nanotube (MWCNT). SEM images shows no formation of CNT on the Si wafer for near distance, which is consistent with the AFM images, X-ray and Raman spectrograms and no existence of characteristics (002) peaks whereas it appears for medium and longer distances, and by experience the optimum distance was found. This means that at closer distance high energy and high intensity plasma particles prevent the formation of CNT. This effect decreases with increasing distance of substrate from the graphite rod.
Highlights
There are many applications of carbon nanotubes in various scientific fields such as electronics, materials, medical science and others
Measurements of the properties of the samples prepared by the above method are: The surface microstructure obtained by a cold field scanning electron microscope (SEM) (JEUM-JSM-6756 F) operating at a voltage of 10 keV
These samples were located at three different distance from carbon rod with 3 mm increment
Summary
There are many applications of carbon nanotubes in various scientific fields such as electronics, materials, medical science and others. Researchers were interested in finding different methods to produce these nanotubes and to study different variables affecting these methods to gain best properties for these tubes: their directions of growth, lengths and densities. Different methods are used in the production of CNTS some of them involve very. (2014) The Effect of Carbon Rod—Specimens Distance on the Structural and Electrical Properties of Carbon Nanotube. In this work preparation of Si-CNT junction without catalyst was done using plasma-sputtering system. The effects of distance variation between the carbon rod and the samples on nanotubes productions and their optical properties have to be examined through the SEM & AFM images, X-ray and Raman spectra
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