Abstract
The effects of C 60 cluster ion beam bombardment in sputter depth profiling of inorganic–organic hybrid multiple nm thin films were studied. The dependence of SIMS depth profiles on sputter ion species such as 500 eV Cs +, 10 keV C 60 +, 20 keV C 60 2+ and 30 keV C 60 3+ was investigated to study the effect of cluster ion bombardment on depth resolution, sputtering yield, damage accumulation, and sampling depth.
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