The effect of aluminum ion implantation on the grain size and structure of UFG titanium

Abstract

Using the transmission electron microscopy technique, we have studied the structural-phase state of UFG titanium with an average grain size ~0.2 μm implanted with aluminum ions. An MEVVA-V.RU source has been used to implant the specimen at room temperature, implantation time 5.25 h, and irradiation dose 1 · 1018 ion/cm2. To produce the UFG titanium samples, we have employed the combined multiple uniaxial pressing technique (abc-pressing) followed by grooved rolling and subsequent annealing at 573 K for 1 h. The samples have been studied in two states: 1) before implantation (initial state) and 2) after implantation at a distance 70–100 nm from the sample surface. We have obtained the aluminum concentration profile of implanted α-Ti. It has been established that the maximum concentration of aluminum is 70 at.% and the thickness of the implanted layer is 200 nm. We have determined the grain distribution functions over the grain size, calculated the grain anisotropy coefficient before and after implantation. It has been established that implantation decreases the average longitudinal and transversal sizes of α-Ti grains, and reduces the anisotropy coefficient by three times. It has been established that aluminum implantation into titanium brings about formation of a whole set of phases with different crystal lattices, namely, β-Ti, TiAl3, Ti3Al, TiC, and TiO2.