The development of pulsed ion sources with explosive ions emission for deposition of films and coatings with ion and electron mixing is considered in the report

Abstract

Summary form only given. The development of pulsed ion sources with explosive ion emission for deposition of films and coatings with ion and electron mixing is considered in the report. The deposition of films and coatings with high hardness and high resistance on the basis using this source on the working voltage 50-100 kV is presented. The deposition of TiB(2), W and other films is discussed and comparison with other results. The experimental results of pulsed electron/ion mixing are considered. The main characteristics of these films and coatings are considered. The cluster mechanism of deposition of films and coatings are discussed. The main question of structure of these films on the basis of surface cluster fractal structure is suggested and discussed. The study of structure of these films showed the new kind of structure of these films and coatings.