Abstract
We report the technological parameters, detection of films and its physical properties of a-C:H films deposited by PECVD method. We study the relationship of film's structure and deposition conditions. It has shown, the ratio of graphite and diamond components in a-C:H films are closely related to the ratio of reactant gases CH 4 /CH 4 +H 2 , D.C.biases and substrate temperature T s in the deposition system. Finaly, we discussed the deposition mechanism of a-C:H films with the chemical Equilibrium equation.
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