Abstract
Cu-based metal halides, such as Cs3Cu2I5, are promising materials for LEDs, photodetectors, and scintillators because of their excellent optical properties, nontoxicity, and high air stability. In this study, we demonstrated the deposition of high-coverage Cs3Cu2I5 thin films using solution-based mist deposition. By adjusting the substrate temperature appropriately, continuous Cs3Cu2I5 thin films were formed. The Cs3Cu2I5 thin films exhibited blue emission under ultraviolet irradiation, with a large Stokes shift of 1.40 eV. Furthermore, they exhibited a high photoluminescence quantum yield of over 80%.
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