Abstract
The phase formation of cobalt germanides on Ge(100) and Ge(111) substrates was investigated using in situ X-ray diffraction, starting from room-temperature sputter-deposited Co films. The formation temperature of the phase was dependent on the substrate orientation. X-ray pole figures and electron backscatter diffraction measurements were used to identify the texture and microstructure of the and the preceding films. A significant difference in preferential orientation was found in the films, depending on the substrate orientation. This influences the formation temperature of the and results in the coexistence of and on Ge(111) in a large temperature window.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have