Tetraboryl derivatives of porphyrins in the synthesis of novel fluorenes

Abstract

A new strategy for the synthesis of fluorene-containing porphyrins by Suzuki–Miyaura reaction using a tetraboryl porphyrin derivative and a fluorene derivative of 4-bromoaniline has been proposed. A number of consecutive chemical transformations of the prepared porphyrin have led to formation of a polyphenol derivative of the above compound. Positive photoresists for lithography with exposing radiation wavelength of 13.5 nm have been developed on the basis of a similar polyphenol, which provided preparation of topological structures with a resolution of 22–16 nm.