Abstract
The paper is devoted to the fundamental physical and technological problems of manufacturing and testing high-precision optical elements and wave fronts of complex optical systems with subnanometer accuracy. The features of using a point diffraction interferometer (PDI) for measurements of high-numerical-aperture (NA ∼ 0.3) optics with generally aspherical surfaces are considered. A new type of PDI reference sphericalwave source used in the interferometer of the Institute for Physics of Microstructures (IPM) is described. The main technical characteristics of the IPM interferometer and the interferometer at the ALS synchrotron (United States) are compared. Some schemes of using the spherical reference wave interferometer for studying aspherical surfaces and their applications for testing the aspherical mirrors of a nanolithographic objective with an operating wavelength of 13.5 nm are considered. The techniques developed at the Institute for Physics of Microstructures for high-precision surface-shape correction are described, and the corresponding results are reported.
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