Abstract
Temporally resolved selective area growth of InP on patterned substrates with openings off-oriented from 1 1 0 direction was studied by low pressure hydride vapour phase epitaxy system. Lateral overgrowth and vertical growth were analysed. The lateral growth rate was observed to be strongly dependent on the orientation of the openings. The maximum lateral growth rate was achieved when the openings oriented at 30° and 60° off 1 1 0 direction. The vertical growth rate was relatively constant, independent of the opening orientation. The growth behaviour of InP in openings aligned at low index directions was explained by dangling bond theory. A new phenomenon of inhomogeneous and orientation dependent dopant distribution within an overgrown layer was observed in stained cross-sections by SEM.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
