Templating Functional Materials Using Self-Assembled Block Copolymer Thin-Film for Nanodevices

Ashwanth Subramanian,Won-Il Lee,Chang-Yong Nam,Nikhil Tiwale

doi:10.3389/fnano.2021.766690

Ashwanth Subramanian, Won-Il Lee + Show 2 more

Open Access

https://doi.org/10.3389/fnano.2021.766690

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Abstract

The nanomorphologies and nanoarchitectures that can be synthesized using block copolymer (BCP) thin-film self-assembly have inspired a variety of new applications, which offer various advantages, such as, small device footprint, low operational power and enhanced device performance. Imperative for these applications, however, is the ability to transform these small polymeric patterns into useful inorganic structures. BCP-templated inorganic nanostructures have shown the potential for use as active materials in various electronic device applications, including, field-effect transistors, photodetectors, gas sensors and many more. This article reviews various strategies that have been implemented in the past decade to fabricate devices at nanoscale using block copolymer thin films.

Highlights

Increasing amount of the cost associated with lithography-based top-down patterning and its complexity has slowed down the aggressive downscaling of semiconductor devices that has been continuing for the past several decades, essentially ending the Moore’s law era
Block Copolymer Thin-Film for Nanodevices been summarized in recent reviews. (Segalman, 2005); (Hu et al, 2014); (Tseng and Darling, 2010) A typical diblock block copolymer (BCP) consists of two immiscible polymeric chains/blocks that are covalently bound to each other at one end
Self-assembled BCP thin films have emerged as a nontraditional material patterning platform, when combined with strategies to convert these nanomorphologies into more useful functional inorganic nanostructures for applications in nanodevices

Summary

INTRODUCTION

Increasing amount of the cost associated with lithography-based top-down patterning and its complexity has slowed down the aggressive downscaling of semiconductor devices that has been continuing for the past several decades, essentially ending the Moore’s law era. Self-assembled block copolymer (BCP) thin films have emerged as a nontraditional material patterning process because of their ability to spontaneously generate various nanopatterns, providing several advantages including reduction in material and processing cost, small feature size (

BLOCK COPOLYMER DERIVED STRATEGIES FOR NANODEVICE FABRICATION

Findings

CONCLUSION