Temperature Promotes Photoluminescence in Lanthanide‐Doped 3D Ceramic Microarchitectures

Abstract

AbstractTwo‐photon lithography (TPL) is a powerful technique for creating 3D microarchitectures. Applied to high‐refractive‐index materials like ZrO2, it promises advanced optics. This is the case of ZrO2 host matrixes in combination with luminescent dopants. However, due to the nonideal crystallinity attained to the TPL pre‐ceramic replica from a custom‐made photoresin, the emission of lanthanide (Ln) dopants in ZrO2 microarchitectures can be suboptimal. However, crystallinity exacerbated by annealing can promote Ln‐emission, thereby enabling the integration of ceramic micro‐optic into a low‐temperature process. This work presents a photoresin containing a metal‐organic monomer tailored for TPL, enabling the fabrication of Ln‐doped tetragonal ZrO2 (t‐ZrO2) microarchitectures. The emission properties of Ln‐doped microarchitectures with trivalent Ln ions (Ln3+), i.e., Yb3+ (2.5 mol%), Er3+ (0.35 mol%), and Tm3+ (0.35 mol%) are studied. The results demonstrate that Ln emission is absent when annealing the microarchitectures at 600 °C. Annealing at 750 °C activates Ln3+ emissions, including 2F5/2–2F7/2 (infrared), 4S3/2–4I15/2 (green), and 3H4–3F6 (near‐infrared) transitions corresponding to Yb, Er, and Tm species. Transmission electron microscopy (TEM) confirms that t‐ZrO2 crystallinity becomes more prominent at 750 °C, demonstrating the promotion of Ln emissions upon thermal treatment and underscoring the role of crystalline in TPL micro‐optical ceramics.