Abstract
Due to their exceptional plasmonic properties, noble metals such as, gold and silver, have been the materials of choice for the demonstration of various plasmonic and nanophotonic phenomena. However, noble metals’ softness, lack of tailorability, and low melting point, along with melting point depression in nanostructures as well as challenges in thin film fabrication and device integration in standard semiconductor processing, have prevented the realization of practical plasmonic devices for technologically important high temperature and heat-assisted applications. In the recent years, titanium nitride (TiN) has emerged as a promising plasmonic material with good metallic and refractory (high temperature stable) properties. The refractory nature of TiN could enable practical plasmonic devices operating at elevated temperatures for energy conversion and harsh-environment industries such as gas and oil. Here we report on the temperature-dependent dielectric functions of TiN thin films of varying thicknesse...
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