Temperature Dependence of Inward Diffusion of Underpotentially-Deposited Cd into a Au (100) Bulk Phase under Electrochemical Environment

Abstract

We investigated the inward diffusion of underpotentially-deposited (UPD) Cd into a Au (100) substrate in 50 mol m -3 sulfuric acid solution under potential control by anodic voltammetry at the temperature range from 295 to 333 K, as well as by the electrochemical quartz crystal microbalance (EQCM) analysis and X-ray diffractmetry (XRD). The anodic voltammograms show that inward diffusion of the Cd adatoms into a Au (100) bulk phase is classified into two types of steps. One is a very fast step, which is the diffusion of UPD Cd into a Au (100) electrode at the surface layer; the activation energy of this step is ≅ 70 kJ mol -1 . The other is a much slower step; the activation energy of this step (110kJ mol -1 ) agrees well with that of Cd bulk diffusion into a Au-Cd compound. The amount of UPD Cd is calculated from EQCM analysis, and it nearly agrees with that obtained from anodic voltammetry. We found that the amount of UPD Cd increases with temperature. We confirmed the formation of β Au-Cd layer on the sample by XRD after maintained at the UPD region of -1100mV vs. Hg/Hg 2 SO 4 for 1 h at 333 K.