Temperature dependence of electroluminescence of Er ions in tunnel diodes based on (111)Si:(Er, O)

Abstract

Electroluminescence and current-voltage characteristics of tunnel diodes obtained by implantation of Er, O, and B ions into n-Si(111) with the subsequent heat treatment are investigated in a temperature range of 80–300 K in the breakdown mode. The observed increase in electroluminescence intensity with temperature for Er ions is caused by thermal emptying of the traps that captured the holes in the n-region of the diode at low temperatures. This emptying leads to a variation in the breakdown characteristics. It is shown that some of the traps at low temperatures retain the charge captured even after the voltage applied to the diode is switched off. This circumstance gives rise to the peculiar memory effect in the structures investigated.