Temperature-Controlled Growth of Silicon-Based Nanostructures by Thermal Evaporation of SiO Powders

Abstract

Silicon-based nanostructures with different morphologies, sizes, compositions, and microstructures were grown on Si wafers by thermal evaporation of SiO powders at 1350 °C for 5 h under 300 Torr of a flowing gas mixture of 5% H2-Ar at a flow rate of 50 standard cubic centimeters per minute (sccm). The SiO powders and Si wafers were placed inside an alumina tube, which was heated by a tube furnace. The local temperature inside the tube was carefully calibrated by a thermal couple. After evaporation, Si-containing products with different colors and appearances were formed on the surfaces of the Si wafers over a wide temperature range of 890-1320 °C and a long distance of 85 mm. Basing on the colors and appearances of the products, five distinct zones, which corresponding to different temperature ranges, were clearly identified from the highest temperature of 1320 °C to the lowest temperature of 890 °C. They are zone I (1250-1320 °C), zone II (1230-1250 °C), zone III (1180-1230 °C), zone IV (930-1180 °C), and zone V (890-930 °C). The deposited products were systematically studied by scanning electron microscopy, transmission electron microscopy, and X-ray diffraction. The results show that, besides Si nanowires, many other kinds of Si-based nanostructures such as octopuslike, pinlike, tadpolelike, and chainlike structures were also formed. The temperature distribution inside the alumina tube was found to play a dominant role on the formation of these structures. It is demonstrated that a control over the growth temperature can precisely control the morphologies and intrinsic structures of the silicon-based nanomaterials. This is an important step toward design and control of nanostructures. The growth mechanisms of these products were briefly discussed.