Abstract
The paper considers the process of obtaining films of vanadium dioxide by the method of deposition of inorganic coatings and films from the vapor phase during the thermal decomposition of organometallic compounds. In recent years, there has been a growing interest in the practical use of organometallic compounds. This has led to the development of many devices that include various vapor deposition techniques. This technology is currently being used as the latest technology. The design of the technological installation for pyrometric film deposition is presented and the principle of operation is given. In the course of the study, film samples were obtained and experimental work was carried out. The results obtained are presented in the form of graphs.
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