Abstract
Maskless exposure makes possible of individual chip design customization and large area chip fabrication that are impossible with mask exposure. We are developing DUV optical maskless exposure tool named as Digital Scanner (DS) that uses a spatial light modulator as a pattern generator and a DUV solid-state laser as a light source (193 or 248 nm). We will report technology development progress of DS including the latest experimental data. Sub-pixel patterning capability by DS will be presented. Finally, we will discuss on the DS production tool with 248 nm exposure wavelength that are being prepared to release in mid-2020s.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
