Digital scanner, optical maskless exposure tool with DUV solid state laser

Abstract

Digital Scanner (DS), a DUV optical maskless exposure tool is being developed. It uses a micromirror-type spatial light modulator (SLM) to create the “mask” pattern combined with a solid state laser with wavelength of 193 or 248 nm. The exposure concept of DS and advantage of solid state laser as an exposure light source is described. DS proof-of-concept tool with resolution of half-pitch 80 nm L/S was developed. The exposure results of maskless unique application such as large area printing and chip ID printing for security purposes are shown.