Abstract
Technological ion sources of the TITAN type have been developed at the Institute of High Current Electronics, RAS, for the last ten years. These sources generate wide-aperture high-current beams of gas or metal ions and also mixed two-component gas-metal ion beams with a controllable component ratio. This is possible due to two discharge systems combined into one discharge system of the source. Metal ions are obtained with a vacuum arc discharge and gas ions are generated with a constricted hollow-cathode low-pressure arc discharge. This paper describes the principle and peculiarities of operation of the given sources, their design, parameters, and fields of application. A modified version of the Mevva ion source is considered. The design of this version is based on the results of studies conducted using the TITAN source.
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