Abstract

Ion source which generates beams of metal or gas ions for modification of organic polymers surfaces by ion implantation is presented. Originally this devise is conventional ion source Mevva-5. Ru based on a vacuum arc discharge [1]. For treatment of polymers such as polyethylene, polyvinyl alcohol and polytetrafluoroethylene is required to generate of silver and argon ions. The main feature was to provide very low mean power density of ion beams for minimizing of destruction polymeric molecules [2]. The beam of silver ions was extracted from vacuum arc discharge plasma. For generation of argon ion beam we made minimal internal changes in construction of ion source discharge chamber and in external electrical circuit. Thus we realized operating of discharge system in a hollow cathode glow discharge mode. Both types of discharges were operated in pulse mode with duty cycle lower 10−4. The current density of ion beam was 10–50 μA/cm2, mean energy of ions was 20 keV. Implantation was performed with fluence 1014–1016 ion/cm2.

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